
Time Deal
New
PURCELL
Pixcell Biom O2 Enhancer Modeling Mask
US$29.00
50%
US$14.50
- Code
- PCP01-PK
- Gross Weight
- 346g (0.76 lbs)
Professional rubber mask that locks in oxygen and moisture for firm, refined skin
- Product Benefit
- Bifida Ferment strengthens barrier and boosts resilience
- Skin Type Fit
- oilydrycombinationsensitivenormal
- Texture & Feel
- Rich & CreamyCooling EffectSoothingFirming
AI-generated from the product information.
Product Details
Description
Creates a flexible, oxygen-activating seal that locks in active ingredients and delivers deep hydration with a 778% moisture boost. Formulated with probiotic ferments to strengthen the barrier while calming irritation and refining pores by 36% in a single use.
Provides instant cooling relief to stressed skin and improves elasticity, leaving skin feeling firm, supple, and refreshed. Designed to work with PURCELL Pixcell Biom booster for enhanced professional-grade results at home.
AI-generated from the product information.
How to use
1. Apply PURCELL Pixcell Biom 2 Billion/mL booster to the face first
2. Mix 1 full scoop (approx. 30g) of the modeling mask powder with 50g of water and stir until smooth
3. Apply the mixture evenly over the face, ensuring thick edges for clean removal
4. Leave on for 15–20 minutes
5. Peel off gently from the edges and remove
6. Wipe any residue with a damp cotton pad
AI-generated from the product information.
Key ingredient
Bifida Ferment Lysate strengthens the skin barrier and improves resilience against environmental stressors, paired with Lactobacillus Ferment Lysate to balance the skin microbiome and soothe irritation. Hydrolyzed Collagen delivers deep nourishment and improves elasticity for plump, firm skin, while Sodium Hyaluronate attracts and retains moisture for an immediate hydration surge. Allantoin rounds out the formula by calming sensitivity and promoting smoothness, and Algin forms the flexible rubber seal that enhances ingredient penetration during masking.
AI-generated from the product information.

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